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1

Phase-shifting point diffraction interferometer

Medecki, H., Tejnil, E., Goldberg, K. A., Bokor, J.

Journal:

Year:

1996

Language:

english

File:

PDF, 452 KB

english, 1996

2

[American Institute of Aeronautics and Astronautics 21st AIAA Applied Aerodynamics Conference - Orlando, Florida ()] 21st AIAA Applied Aerodynamics Conference - Automated CFD Database Generation for a 2nd Generation Glide Back Booster

Chaderjian, Neal, Rogers, Stuart, Pandya, Shishir, Ahmad, Jasim, Tejnil, Edward

Year:

2003

Language:

english

File:

PDF, 2.79 MB

english, 2003

3

Impact of 14-nm photomask uncertainties on computational lithography solutions

Sturtevant, John, Tejnil, Edita, Lin, Tim, Schulze, Steffen, Buck, Peter, Kalk, Franklin, Nakagawa, Kent, Ning, Guoxiang, Ackmann, Paul, Gans, Fritz, Buergel, Christian

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 3.55 MB

english, 2013

4

Accurate, full-chip, three-dimensional electromagnetic field model for non-Manhattan mask corners

Lam, Michael C., Clifford, Chris, Oliver, Mike, Fryer, David, Tejnil, Edita, Adam, Kostas

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 3.79 MB

english, 2016

5

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Heuristics for truncating the number of optical kernels in Hopkins image calculations for model-based OPC treatment

Zuniga, Christian, Tejnil, Edita, Flagello, Donis G.

Year:

2007

Language:

english

File:

PDF, 430 KB

english, 2007

6

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Lithography strategy for 65-nm node

Borodovsky, Yan A., Schenker, Richard E., Allen, Gary A., Tejnil, Edita, Hwang, David H., Lo, Fu-Chang, Singh, Vivek K., Gleason, Robert E., Brandenburg, Joseph E., Bigwood, Robert M., Kawahira, Hiroi

Year:

2002

Language:

english

File:

PDF, 1.87 MB

english, 2002

7

[American Institute of Aeronautics and Astronautics 2018 AIAA/CEAS Aeroacoustics Conference - Atlanta, Georgia ()] 2018 AIAA/CEAS Aeroacoustics Conference - Computational Investigation and Validation of Flow Induced Noise of Legacy NACA Propeller

Tejnil, Edward, Zhang, Zhidong

Language:

english

File:

PDF, 1.47 MB

english

8

Phase Effects Owing to Multilayer Coatings in a Two-Mirror Extreme-Ultraviolet Schwarzschild Objective

Tejnil, Edita, Goldberg, Kenneth A., Bokor, Jeffrey

Journal:

Year:

1998

Language:

english

File:

PDF, 2.78 MB

english, 1998

9

Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions

Attwood, D.T., Naulleau, P., Goldberg, K.A., Tejnil, E., Chang Chang, Beguiristain, R., Batson, P., Bokor, J., Gullikson, E.M., Koike, M., Medecki, H., Underwood, J.H.

Journal:

IEEE Journal of Quantum Electronics

Year:

1999

Language:

english

File:

PDF, 647 KB

english, 1999

10

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - Roadmap to sub-nanometer OPC model accuracy

Sturtevant, John L., Tejnil, Edita, Kato, Kokoro

Year:

2012

Language:

english

File:

PDF, 871 KB

english, 2012

11

[American Institute of Aeronautics and Astronautics 16th AIAA Computational Fluid Dynamics Conference - Orlando, Florida ()] 16th AIAA Computational Fluid Dynamics Conference - Automated CFD Parameter Studies on Distributed Parallel Computers

Rogers, Stuart, Aftosmis, Michael, Pandya, Shishir, Chaderjian, Neal, Tejnil, Edward, Ahmad, Jasim

Year:

2003

File:

PDF, 1019 KB

2003

12

Actinic detection of sub-100 nm defects on extreme ultraviolet lithography mask blanks

Jeong, Seongtae, Johnson, Lewis, Rekawa, Seno, Walton, Chris C., Prisbrey, Shon T., Tejnil, Edita, Underwood, James H., Bokor, Jeffrey

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1999

Language:

english

File:

PDF, 453 KB

english, 1999

13

Interferometry using undulator sources (invited, abstract)

Beguiristain, R., Goldberg, K. A., Tejnil, E., Bokor, J., Medecki, H., Attwood, D. T., Jackson, K.

Journal:

Review of Scientific Instruments

Year:

1996

Language:

english

File:

PDF, 713 KB

english, 1996

14

[IEEE LEOS '92 - Boston, MA, USA (16-19 Nov. 1992)] LEOS '92 Conference Proceedings - Properties Of Visible Light Emitting (Al/sub y/Ga(/sub 1-y))/sub 0.5/In/sub 0.5/P Multiple Quantum Well Lasers With Varying Quantum Well Al Compositions.

Thornton, R.L., Tejnil, E., Mosby, W.J., Bour, D.

Year:

1992

Language:

english

File:

PDF, 124 KB

english, 1992

15

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - EUVL defect printability at the 32-nm node

Gullikson, Eric M., Tejnil, Edita, Liang, Ted, Stivers, Alan R., Mackay, R. Scott

Year:

2004

Language:

english

File:

PDF, 104 KB

english, 2004

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Accurate, full chip 3D electromagnetic field model for non-Manhattan mask corners

Lai, Kafai, Erdmann, Andreas, Lam, Michael, Clifford, Chris, Oliver, Michael, Fryer, David, Tejnil, Edita, Adam, Kostas

Year:

2015

Language:

english

File:

PDF, 2.27 MB

english, 2015

17

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Enhanced optical inspectability of patterned EUVL mask

Liang, Ted, Stivers, Alan R., Yan, Pei-yang, Tejnil, Edita, Zhang, Guojing, Dao, Giang T., Grenon, Brian J.

Year:

2002

Language:

english

File:

PDF, 203 KB

english, 2002

18

At-wavelength interferometry for extreme ultraviolet lithography

Year:

1997

Language:

english

File:

PDF, 4.75 MB

english, 1997

19

Pattern specific optical models

E. Tejnil, K. Adam, M. C. Lam, G. Berger

Year:

2008

Language:

english

File:

PDF, 978 KB

english, 2008

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - The impact of 14-nm photomask uncertainties on computational lithography solutions

Sturtevant, John, Conley, Will, Tejnil, Edita, Lin, Tim, Schultze, Steffen, Buck, Peter, Kalk, Franklin, Nakagawa, Kent, Ning, Guoxiang, Ackmann, Paul, Gans, Fritz, Buergel, Christian

Year:

2013

Language:

english

File:

PDF, 761 KB

english, 2013

21

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Dependence of mask-defect printability and printability criteria on lithography process resolution

Stivers, Alan R., Tejnil, Edita, Dao, Giang T., Grenon, Brian J.

Year:

2002

Language:

english

File:

PDF, 943 KB

english, 2002

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - OPC model prediction capability improvements by accounting for mask 3D-EMF effects

Cheng, Jacky, Schramm, Jessy, Zhang, Dong Qing, Foong, Yee Mei, Zuniga, Christian, Do, Thuy, Tejnil, Edita, Sturtevant, John, Chung, Angeline, Jantzen, Kenneth, Conley, Will

Year:

2012

Language:

english

File:

PDF, 1.13 MB

english, 2012

23

SPIE Proceedings [SPIE 30th European Mask and Lithography Conference - Dresden, Germany (Tuesday 24 June 2014)] 30th European Mask and Lithography Conference - 14-nm photomask simulation sensitivity

Behringer, Uwe F. W., Sturtevant, John, Buck, Peter, Schulze, Steffen, Fryer, David, Tejnil, Edita, Adam, Kostas, Lam, Michael, Clifford, Chris, Oliver, Mike, Armeanu, Ana, Kalk, Franklin, Nakagawa, K

Year:

2014

Language:

english

File:

PDF, 4.41 MB

english, 2014

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Advanced mask process modeling for 45-nm and 32-nm nodes

Tejnil, Edita, Hu, Yuanfang, Sahouria, Emile, Schulze, Steffen, Tian, Ming Jing, Guo, Eric

Year:

2008

Language:

english

File:

PDF, 273 KB

english, 2008

25

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Alternating phase-shift masks for contact patterning

Schenker, Richard E., Allen, Gary A., Tejnil, Edita, Ogadhoh, Shem, Yen, Anthony

Year:

2003

Language:

english

File:

PDF, 229 KB

english, 2003

26

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Emerging Lithographic Technologies - Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry

Goldberg, Kenneth A., Tejnil, Edita, Lee, Sang Hun, Medecki, Hector, Attwood, Jr., David T., Jackson, Keith H., Bokor, Jeffrey, Seeger, David E.

Year:

1997

Language:

english

File:

PDF, 554 KB

english, 1997

27

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - The impact of 14nm photomask variability and uncertainty on computational lithography solutions

Sturtevant, John, Tejnil, Edita, Buck, Peter, Schulze, Steffen, Kalk, Franklin, Nakagawa, Kent, Ning, Guoxiang, Ackmann, Paul, Gans, Fritz, Buergel, Christian, Faure, Thomas B., Ackmann, Paul W.

Year:

2013

Language:

english

File:

PDF, 789 KB

english, 2013

28

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks

Tejnil, Edita, Stivers, Alan R., Schenker, Richard E., Zurbrick, Larry S., Morimoto, Hiroaki

Year:

2000

Language:

english

File:

PDF, 3.94 MB

english, 2000

29

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - EUV mask patterning approaches

Yan, Pei-yang, Zhang, Guojing, Kofron, Patrick, Chow, Jenn, Stivers, Alan R., Tejnil, Edita, Cardinale, Gregory F., Kearney, Patrick A., Vladimirsky, Yuli

Year:

1999

Language:

english

File:

PDF, 2.01 MB

english, 1999

30

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Lithography-based automation in the design of program defect masks

Vakanas, George P., Smith, Bruce W., Munir, Saghir, Tejnil, Edita, Bald, Daniel J., Nagpal, Rajesh

Year:

2004

Language:

english

File:

PDF, 129 KB

english, 2004

31

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme-ultraviolet lithography

Tejnil, Edita, Staud, Wolfgang, Weed, J. Tracy, Gullikson, Eric M., Stivers, Alan R.

Year:

2004

Language:

english

File:

PDF, 143 KB

english, 2004

32

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - EUV mask fabrication with Cr absorber

Mangat, Pawitter J. S., Hector, Scott D., Rose, Stewart, Cardinale, Gregory F., Tejnil, Edita, Stivers, Alan R., Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 1.47 MB

english, 2000

33

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Pattern Inspection of EUV Masks Using DUV Light

Liang, Ted, Tejnil, Edita, Stivers, Alan R., Grenon, Brian J., Kimmel, Kurt R.

Year:

2002

Language:

english

File:

PDF, 399 KB

english, 2002

34

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Actinic EUVL mask blank defect inspection system

Jeong, Seongtae, Johnson, Lewis E., Lin, Yun, Rekawa, Senajith, Yan, Pei-yang, Kearney, Patrick A., Tejnil, Edita, Underwood, James H., Bokor, Jeffrey, Vladimirsky, Yuli

Year:

1999

Language:

english

File:

PDF, 1.31 MB

english, 1999

35

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Tritone inspection for embedded phase-shift mask

Cheng, Wen-Hao, Farnsworth, Jeff N., Tejnil, Edita, Grenon, Brian J., Dao, Giang T.

Year:

2001

Language:

english

File:

PDF, 315 KB

english, 2001

36

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Characterizing OPC model accuracy versus lens induced polarization effects in hyper NA immersion lithography

Tawfik, Tamer M., Kawahira, Hiroichi, Zurbrick, Larry S., Tejnil, Edita

Year:

2008

Language:

english

File:

PDF, 471 KB

english, 2008

37

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Modeling the defect inspection sensitivity of a confocal microscope

Gullikson, E. M., Mackay, R. Scott, Tejnil, E., Tsai, K.-Y., Stivers, A. R., Kusunose, H.

Year:

2005

Language:

english

File:

PDF, 67 KB

english, 2005

38

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Options for at-wavelength inspection of patterned extreme ultraviolet lithography masks

Tejnil, Edita, Stivers, Alan R., Abboud, Frank E., Grenon, Brian J.

Year:

1999

Language:

english

File:

PDF, 1.19 MB

english, 1999

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Influence of the illumination source on model-based SRAF placement

Gupta, Rachit, Dave, Aasutosh, Tejnil, Edita, Jayaram, Srividya, LaCour, Pat

Year:

2011

Language:

english

File:

PDF, 4.87 MB

english, 2011

40

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - A single-exposure approach for patterning 45nm flash/DRAM contact hole mask

Chen, Ting, Hoga, Morihisa, Van Den Broeke, Doug, Tejnil, Edita, Hsu, Stephen, Park, Sangbong, Berger, Gabriel, Coskun, Tamer, De Vocht, Joep, Corcoran, Noel, Chen, J. Fung, van der Heijden, Eddy, Fin

Year:

2006

Language:

english

File:

PDF, 736 KB

english, 2006

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Optical Microlithography XXX - Application of optical similarity in OPC model calibration

Erdmann, Andreas, Kye, Jongwook, Tejnil, Edita

Year:

2017

Language:

english

File:

PDF, 485 KB

english, 2017

42

[ASCE CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY - Gaithersburg, Maryland (USA) (23-27 March 1998)] The 1998 international conference on characterization and metrology for ULSI technology - At-wavelength interferometry of extreme ultraviolet lithographic optics

Lee, Sang Hun, Naulleau, Patrick, Goldberg, Kenneth, Tejnil, Edita, Medecki, Hector, Bresloff, Cynthia, Chang, Chang, Attwood, David, Bokor, Jeffrey

Year:

1998

Language:

english

File:

PDF, 1.09 MB

english, 1998

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